Veröffentlichungen "Fujimura, Ryushi"

Matsumori, Kishin ; Fujimura, Ryushi ; Retsch, Markus:
Coupling Strength and Total Damping Govern Electromagnetically Induced Absorption in Coupled Plasmonic Systems.
In: Advanced Photonics Research. Bd. 4 (2023) Heft 6 . - 2200211.
ISSN 2699-9293
DOI der Verlagsversion: https://doi.org/10.1002/adpr.202200211