Matsumori, Kishin ; Fujimura, Ryushi ; Retsch, Markus: Coupling Strength and Total Damping Govern Electromagnetically Induced Absorption in Coupled Plasmonic Systems. In: Advanced Photonics Research. Vol. 4 (2023) Issue 6 . - 2200211. ISSN 2699-9293 DOI der Verlagsversion: https://doi.org/10.1002/adpr.202200211
